TECHNOLOGY AND MEASUREMENTS OF MAGNETORESISTANCE IN THIN-LAYERED FERROMAGNETIC STRUCTURES

Jakub Kisała


Lublin University of Technology (Poland)

Karolina Czarnacka


University of Life Sciences in Lublin (Poland)
http://orcid.org/0000-0003-1434-734X

Mateusz Gęca


Lublin University of Technology (Poland)
https://orcid.org/0000-0002-0519-7389

Andrzej Kociubiński

akociub@semiconductor.pl
Lublin University of Technology (Poland)
https://orcid.org/0000-0002-0377-8243

Abstract

The paper presents the technology for obtaining NiFe/Ti/NiFe layer structures in MEMS technology using magnetron purge with the assumption of being used as semi-magnetic sensors. A series of samples was made on a glass substrate with a sandwich structure, where the individual layers were 100 nm NiFe, 10 nm Ti and on top again NiFe with a thickness of 100 nm. Measurements of DC resistance of the obtained structures in a constant magnetic field, which was produced by neodymium magnets and an electromagnet, were carried out. The obtained results confirm the occurrence of phenomena known as the magnetoresistance effect. The influence of the spatial arrangement of structures relative to the constant magnetic field vector was checked and proved.


Keywords:

static magnetic field, magnetron sputtering, MEMS, magnetoresistance

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Published
2020-03-30

Cited by

Kisała, J., Czarnacka, K., Gęca, M., & Kociubiński, A. (2020). TECHNOLOGY AND MEASUREMENTS OF MAGNETORESISTANCE IN THIN-LAYERED FERROMAGNETIC STRUCTURES. Informatyka, Automatyka, Pomiary W Gospodarce I Ochronie Środowiska, 10(1), 44–47. https://doi.org/10.35784/iapgos.896

Authors

Jakub Kisała 

Lublin University of Technology Poland

Authors

Karolina Czarnacka 

University of Life Sciences in Lublin Poland
http://orcid.org/0000-0003-1434-734X

Authors

Mateusz Gęca 

Lublin University of Technology Poland
https://orcid.org/0000-0002-0519-7389

Authors

Andrzej Kociubiński 
akociub@semiconductor.pl
Lublin University of Technology Poland
https://orcid.org/0000-0002-0377-8243

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